By Ansel Adams and Edward Burtynsky
Application
Framed Art
Category
Art Museum
Location
Shelburne Museum, Shelburne, VT
June 19, 2010 – October 24, 2010
Medium
Photography
Size
Various
Glazing
Optium Museum Acrylic®
The Challenge
To protect photographs during exhibition while providing an optimal viewing experience.
The Solution
Optium Museum Acrylic
Anti-reflective
Allows viewers to see the photographs without distracting reflections.
99% UV blocking
Protects the photographs from the most damaging light wavelengths, helping prevent fading and degradation.
Acrylic is half the weight of glass and shatter resistant
Safeguards against injury and damage to art work and visitors.
Anti-static protection exceeds that of glass
Immediate eliminates static charge. Makes for safer, easier framing and less cleaning.
Abrasion resistant
A durable hard coat protects against scratches from cleaning and general exposure to the public.
The Work
This exhibit at the Shelburne Museum featured the legendary American wilderness photography of Ansel Adams contrasted with Edward Burtynsky’s contemporary images of global industrialization. The exhibit included over 60 extraordinary photographs and was the museum’s first exhibit of photography.
More Info
- For more information on Edward Burtynsky, click here.
- For more information on Ansel Adams, click here.
- Visit the Optium Museum Acrylic product page to view specifications and product information.